Tungsten Silicide WSi2 Powder CAS 12039-88-2

About Tungsten Silicide WSi2 Powder :
Tungsten silicide (WSi2) is an inorganic compound, a silicide of tungsten. It is a conductive ceramic material. Tungsten silicide reacts violently with substances between strong acids, fluorine, oxidants and halogens. WSi2 as an anti-oxidation coating performs well in applications. In particular, similar to molybdenum disilicide MoSi2, the high emissivity of tungsten disilicide makes this material attractive for high-temperature radiant cooling and has the meaning of a heat shield.
 
Silicide is used in microelectronics as contact material, with a resistivity of 60-80μΩcm; it forms 1000°C. It is usually used as a shunt for polysilicon wires to increase their conductivity and increase signal speed. The silicide layer can be prepared by chemical vapor deposition, for example, using monosilane or dichlorosilane and tungsten hexafluoride as the source gas. The deposited film is non-stoichiometric and requires annealing to convert to a more resulting stoichiometric form. Tungsten silicide is a substitute for the early tungsten film. Tungsten silicide can also be used in microelectromechanical systems and oxidation-resistant coatings. Feel free to send an inquiry to get the latest price if you would like to buy Tungsten Silicide WSi2 Powder in bulk.

Characteristics of Tungsten Silicide WSi2 Powder:
Tungsten silicide WSi2 powder (CAS 12039-88-2) has a high melting point, high corrosion resistance, high oxidation resistance, good electrical
conductivity, high-temperature ductility, a binary alloy system the intermediate phase.

Technical Parameter of Tungsten Silicide WSi2 Powder:

Chemical Composition of Tungsten Silicide WSi2 Powder:

How is Tungsten Silicide WSi2 Powder produced?
Tungsten powder and silicon powder are used as raw materials for synthetic silicide tungsten powder. They have an average of 24 hours in acetone. The starting powder is used in the measurement of thermal measurements, while the powder is 5: 1. Dry substances and dried, acetone evaporation. The preparative mixture was heat-treated at different temperatures at 50 ° C at different temperatures of 1250 to 1400 ° C. The heating rate is 10k · min -1. The mixture was placed in a tube furnace and heat treatment was carried out in an argon flow for 4 hours. After the heat treatment is over, the furnace is cooled to room temperature.
 
Application of Tungsten Silicide WSi2 Powder :
Tungsten silicide WSi2 powder is used in microelectronics as an electric shock material, shunting on polysilicon wires, anti-oxidation coating and resistance wire coating. Tungsten silicide is used as a contact material in microelectronics, with a resistivity of 60-80μΩcm; it is formed at 1000°C. It is usually used as a shunt for polysilicon lines to increase their conductivity and increase signal speed. The tungsten silicide layer can be prepared by chemical vapor deposition, such as vapor deposition. Use monosilane or dichlorosilane and tungsten hexafluoride as raw material gas. The deposited film is non-stoichiometric and requires annealing to transform into a more conductive stoichiometric form.
Tungsten silicide can replace the early tungsten film. Tungsten silicide is also used as a barrier layer between silicon and other metals.
Tungsten silicide is also very valuable in micro-electromechanical systems, in which tungsten silicide is mainly used as a thin film for the manufacture of microcircuits. For this purpose, a film of tungsten silicide can be plasma-etched using, for example, silicide.

Packing & Shipping of Tungsten Silicide WSi2 Powder:
We have many different kinds of packing which depend on the tungsten silicide WSi2 powder quantity.
Tungsten silicide WSi2 powder packing: vacuum packing, 1kg/bag, 25kg/barrel, or as your request.
Tungsten silicide WSi2 powder shipping: could be shipped out by sea, by air, by express as soon as possible once payment receipt.